Organosilicon polymers for lithographic applications
- J.M. Shaw
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Paper
Publications
22 results for E. Babich
A new family of non-chemically amplified resists
- Ari Aviram
- Marie Angelopoulos
- et al.
- 1998
- Microlithography 1998
Conference paperMicrolithographic applications of silicon-containing polymers and individual organosilicon compounds
- E. Babich
- 1998
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Conference paperCross-linking of poly{1,1-diaryl(alkyl,aryl) 1-silacyclobutanes} under electron beam and deep UV irradiation
- E. Babich
- S. Rishton
- et al.
- 1997
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
PaperDetermination of Helium presence in the mask/wafer gap of X-ray lithography steppers
- Juan R. Maldonado
- Ron DellaGuardia
- et al.
- 1995
- Microelectronic Engineering
PaperHigh performance dielectrics and processes for ULSI interconnection technologies
- J. Paraszczak
- D. Edelstein
- et al.
- 1993
- IEDM 1993
Conference paperComparison of vapor and liquid phase silylation processes of photoresists
- E. Babich
- J. Paraszczak
- et al.
- 1991
- Microelectronic Engineering
PaperSilylation of (photo)resist materials using polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1989
- ACS National Meeting 1989
Conference paperA simple bilayer lift-off process
- David F. Witman
- Jane M. Shaw
- et al.
- 1990
- Microelectronic Engineering
PaperSilylation of resist materials using di- and polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1990
- Microelectronic Engineering
Paper