PaperA comparison of the E-beam and UV-sensitivities and relative O2- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groupsE. Babich, J.M. Shaw, et al.Microelectronic Engineering
PaperA comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymersE. Babich, J. Paraszczak, et al.Microelectronic Engineering
PaperThe use of organosilicon polymers in multilayer plasma resist processingJ. Paraszczak, E. Babich, et al.Microelectronic Engineering
PaperOrganosilicon polymers for lithographic applicationsJ.M. Shaw, M. Hatzakis, et al.Polymer Engineering & Science
