PaperThe use of organosilicon polymers in multilayer plasma resist processingJ. Paraszczak, E. Babich, et al.Microelectronic Engineering
Conference paperSilylation of (photo)resist materials using polyfunctional organosilicon compoundsE. Babich, J. Paraszczak, et al.ACS National Meeting 1989
PaperOrganosilicon polymers for lithographic applicationsJ.M. Shaw, M. Hatzakis, et al.Polymer Engineering & Science
PaperX-ray photoelectron and infrared spectroscopy of microwave plasma etched polyimide surfacesN.J. Chou, J. Paraszczak, et al.Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films