Dry Resist Characterization Towards Technology Insertion for 28-36P EUV Patterning

Talk

23 Feb 2025

Abstract

We assess dry resist capability to enable full design space random logic at 28 and 36P with a single exposure process below 40mJ.

Invited talk

Heinz Schmid

FAME 2023

Conference paper

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SPIE OPTO 2021

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ITherm 2025