Evaluating Novel Material Stacks Towards Gate Width Roughness Reduction
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
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17 results at SPIE Advanced Lithography + Patterning 2025
Accelerating High NA EUV Lithography Insertion for Interconnect Scaling and Beyond: Performance, Cost, and Future Prospects
- Luciana Meli
- Indira Seshadri
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Scatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps
- Padraig Timoney
- Stefan Schoeche
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Multi-reticle stitching: Applications from packaging to High-NA EUV
- Chris Bottoms
- Rick Johnson
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Guided Random Synthetic Layout Generation and Machine-Learning Based Defect Prediction for Leading Edge Technology Node Development
- Geng Han
- Mohamed Talbi
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
High Volume Manufacturing Innovations for Metal-Oxide Resist Patterning
- Nicholas Latham
- Jennifer Church
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Metrology-Design Co-Optimization for BEOL dimensional characterization using scatterometry
- Stefan Schoeche
- Daniel Schmidt
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
AFM Assisted Hybrid Bonding Interface Optimization
- Nick Polomoff
- Jennifer Fullam
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
High resolution patterning of positive resist for semi-additive process
- Elizabeth A. Duch
- Minhua Lu
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Predicting and Measuring Scummed Contact Holes
- Elisa Novelli
- Chris A. Mack
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025