On the Removal of Insulator Process Induced Radiation Damage from Insulated Gate Field Effect Transistors at Elevated Pressure

K.N. Tu

Materials Science and Engineering: A

Q.R. Huang, Ho-Cheol Kim, et al.

Macromolecules

R. Ghez, M.B. Small

JES

R. Ghez, J.S. Lew

Journal of Crystal Growth