Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules
Paper
On the Removal of Insulator Process Induced Radiation Damage from Insulated Gate Field Effect Transistors at Elevated Pressure
Abstract
No abstract available.
Related
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
A. Gangulee, F.M. D'Heurle
Thin Solid Films
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME