Publications

39 results for Arnold Reisman

On the Removal of Insulator Process Induced Radiation Damage from Insulated Gate Field Effect Transistors at Elevated Pressure
- - A. Reisman
  - J.M. Aitken
  - et al.
- 2019
- JES
The Controlled Etching of Silicon in Catalyzed Ethylenediamine-Pyrocatechol-Water Solutions
- - A. Reisman
  - M. Berkenblit
  - et al.
- 2019
- JES
The Formation of SiO₂ in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorr
- - A. Ray
  - A. Reisman
- 2019
- JES
Plasma Oxide FET Devices
- - A. Ray
  - A. Reisman
- 2019
- JES
The Etching of Crystallographically Determined Orifices in Sapphire
- - A. Reisman
  - M. Berkenblit
  - et al.
- 2019
- JES
The Formation of SiO₂ in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorr
- - A. Ray
  - A. Reisman
- 2019
- JES
Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their Elimination
- - A. Reisman
  - M. Berkenblit
  - et al.
- 2019
- JES
The Effects of Pressure, Temperature, and Time on the Annealing of lonizing Radiation Induced Insulator Damage in N-channel IGFET's
- - A. Reisman
  - C.J. Merz
- 2019
- JES
Low Energy X-Ray and Electron Damage to IGFET Gate Insulators
- - C.J. Merz
  - J.R. Maldonado
  - et al.
- 2019
- JES
X-Ray Damage Considerations in MOSFET Devices
- - J.R. Maldonado
  - S.S. Iyer
- 2019
- JES