Anomalous Etch Structures Using Ethylenediamine-Pyrocatechol-Water Based Etchants and Their EliminationA. ReismanM. Berkenblitet al.2019JES
On the Removal of Insulator Process Induced Radiation Damage from Insulated Gate Field Effect Transistors at Elevated PressureA. ReismanJ.M. Aitkenet al.2019JES
The Effects of Pressure, Temperature, and Time on the Annealing of lonizing Radiation Induced Insulator Damage in N-channel IGFET'sA. ReismanC.J. Merz2019JES
Nitridation of silicon in a multiwafer plasma systemA. ReismanM. Berkenblitet al.1984Journal of Electronic Materials
Heat dissipation from silicon chips in a vertical plate, elevated pressure cold wall systemA. ReismanM. Berkenblitet al.1982Journal of Electronic Materials