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ADMETA 2010
Conference paper
01 Dec 2010

Competitive and cost effective copper/low-k interconnect (BEOL) for 28nm CMOS technologies

Abstract

No abstract available.

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Date

01 Dec 2010

Publication

ADMETA 2010

Authors

  • Rod Augur
  • Craig Child
  • J.H. Ahn
  • Teck Jung Tang
  • L. Clevenger
  • D. Kioussis
  • H. Masuda
  • R. Srivastava
  • Y. Oda
  • H. Oguma
  • R. Quon
  • B. Kim
  • H. Sheng
  • S. Hirooka
  • R. Gupta
  • Alan Thomas
  • S.M. Singh
  • Q. Fang
  • R. Schiwon
  • Bassem Hamieh
  • E. Wornyo
  • S. Allen
  • Erdem Kaltalioglu
  • T. Fryxell
  • Atsushi Ogino
  • E. Shimada
  • H. Aizawa
  • H. Minda
  • S.O. Kim
  • T. Oki
  • K. Fujii
  • M. Pallachalil
  • T. Takewaki
  • C.-K. Hu
  • B. Sundloff
  • D. Permana
  • Tibor Bolom
  • B. Engel
  • Catherine Labelle
  • B. Sapp
  • H. Shobha
  • S. Gates
  • E.T. Ryan
  • G. Bonilla
  • T. Daubenspeck
  • T.M. Shaw
  • G. Osborne
  • Alfred Grill
  • D. Edelstein
  • D.D. Restaino
  • Steven Molis
  • T. Spooner
  • Paul Ferreira
  • Glenn Biery
  • Ron Sampson
IBM-affiliated at time of publication

Topics

  • Physical Sciences

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