P.B. Madakson, S. Nunes, et al.
Nuclear Inst. and Methods in Physics Research, B
A novel reduced mask process is used to fabricate high-resolution high-aperture-ratio 10.5-in. SXCA (1280 × 1024) displays. The process uses copper gate-metallurgy with redundancy, without the need for extra processing steps. The resulting displays have 150-dpi color resolution, an aperture ratio of over 35%, and excellent image quality, making them the first high-resolution displays that are suitable for notebook applications.
P.B. Madakson, S. Nunes, et al.
Nuclear Inst. and Methods in Physics Research, B
C.-K. Hu, K.Y. Lee, et al.
JES
L. Clevenger, B. Arcot, et al.
MRS Spring Meeting 1996
K.P. Rodbell, E.G. Colgan, et al.
MRS Spring Meeting 1994