Wideband mmWave CML static divider in 65nm SOI CMOS technology
Daeik D. Kim, Ongyeun Cho, et al.
CICC 2008
A 90-nm silicon-on-insulator (SOI) CMOS system on-chip integrates high-performance FETs with 243-GHz Ft, 208-GHz Fmax, 1.45-mS/μm gm, and sub 1.1-dB NFmin up to 26 GHz. Inductor Q of 20, VNCAP of 1.8-fF/μm2, varactor with a tuning range as high as 25:1, and a low-loss microstrip. Transmission lines were successfully integrated without extra masks and processing steps. SOI and its low parasitic junction capacitance enables this high level of performance and will expand the use of CMOS for millimeter-wave applications. © 2005 IEEE.
Daeik D. Kim, Ongyeun Cho, et al.
CICC 2008
Wooram Lee, Caglar Ozdag, et al.
CSICS 2017
Jean-Olivier Plouchart, Jonghae Kim, et al.
ISLPED 2003
Neric H.W. Fong, Jean-Olivier Plouchart, et al.
IEEE Journal of Solid-State Circuits