Dario Goldfarb

Title

Research Staff Member
Dario Goldfarb

Publications

  • IBM Lithography Roadmap and Need for Future Lithography Tools

      • Allen Gabor
      • Martin Burkhardt
      • et al.
    • 2025
    • EUVL and Source Workshop 2025
  • Dry heterometallic resist processing based on thermal sublimation deposition and development

      • Dario Goldfarb
      • Scott Lewis
      • et al.
    • 2022
    • JM3
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Patents

    • 03 Jun 2011
    • JP
    • 4755529

    Immersion Lithography Contamination Gettering Layer

    • 22 Feb 2011
    • US
    • 7892705

    Photomask And Method Of Making Thereof

    • 11 Jan 2011
    • US
    • 7869002

    Reducing Contamination In Immersion Lithography

    • 19 Oct 2010
    • US
    • 7816069

    Graded Spin-on Organic Antireflective Coating For Photolithography

    • 05 Oct 2010
    • US
    • 7807335

    Immersion Lithography Contamination Gettering Layer

    • 31 Aug 2010
    • US
    • 7787101

    Apparatus And Method For Reducing Contamination In Immersion Lithography

    • 24 Aug 2010
    • US
    • 7782445

    Reducing Contamination In Immersion Lithography

    • 01 Jun 2010
    • US
    • 7727708

    Method For Fabricating Dual Damascene Structures

    • 17 Feb 2010
    • CN
    • ZL200610144473.4

    Method For Multilevel Multiexposure Dual Damascene Structures

    • 23 Sep 2009
    • CN
    • ZL200710004363.2

    Apparatus And Method For Reducing Contamination In Immersion Lithography

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Top collaborators

LM
Luciana Meli

Luciana Meli

Senior Manager: Patterning & Metrology
JR
Jed Rankin

Jed Rankin

Photomask Supply and Development Strategy
AG
Allen Gabor

Allen Gabor

Distinguished Engineer
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Work location

IBM Research - Yorktown HeightsYorktown Heights, NY USA

Contact

More publications

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