Dario Goldfarb

Title

Research Staff Member
Dario Goldfarb

Publications

  • IBM Lithography Roadmap and Need for Future Lithography Tools

      • Allen Gabor
      • Martin Burkhardt
      • et al.
    • 2025
    • EUVL and Source Workshop 2025
  • Dry heterometallic resist processing based on thermal sublimation deposition and development

      • Dario Goldfarb
      • Scott Lewis
      • et al.
    • 2022
    • JM3
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Patents

    • 12 Mar 2018
    • US
    • 9915867

    Mechanical Isolation Control For An Extreme Ultraviolet (euv) Pellicle

    • 12 Jul 2016
    • US
    • 9389516

    Resist Performance For The Negative Tone Develop Organic Development Process

    • 15 Jul 2015
    • JP
    • 5768410

    (shin-etsu) Near-infrared Absorptive Layer-forming Composition And Multilayer Film

    • 30 Jun 2015
    • US
    • 9069245

    Near-infrared Absorptive Layer-forming Composition And Multilayer Film

    • 16 Jun 2015
    • US
    • 9057957

    Extreme Ultraviolet (euv) Radiation Pellicle Formation Method

    • 16 Jun 2015
    • US
    • 9057960

    Resist Performance For The Negative Tone Develop Organic Development Process

    • 21 Apr 2015
    • US
    • 9012133

    Removal Of Alkaline Crystal Defects In Lithographic Patterning

    • 17 Apr 2015
    • JP
    • 5728822

    Near-infrared Absorptive Layer-formg Composition And Multilayer Film

    • 20 Mar 2015
    • TW
    • I477529

    Near-infrared Absorptive Layer-forming Composition And Multilayer Film

    • 11 Mar 2015
    • CN
    • ZL201080036605.6

    Near-infrared Absorbing Film Compositions

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Top collaborators

LM
Luciana Meli

Luciana Meli

Senior Manager: Patterning & Metrology
JR
Jed Rankin

Jed Rankin

Photomask Supply and Development Strategy
AG
Allen Gabor

Allen Gabor

Distinguished Engineer
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Work location

IBM Research - Yorktown HeightsYorktown Heights, NY USA

Contact

More publications

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