Dario Goldfarb

Title

Research Staff Member
Dario Goldfarb

Publications

  • IBM Lithography Roadmap and Need for Future Lithography Tools

      • Allen Gabor
      • Martin Burkhardt
      • et al.
    • 2025
    • EUVL and Source Workshop 2025
  • Dry heterometallic resist processing based on thermal sublimation deposition and development

      • Dario Goldfarb
      • Scott Lewis
      • et al.
    • 2022
    • JM3
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Patents

    • 18 Apr 2022
    • US
    • 11307496

    Metal Brush Layer For Euv Patterning

    • 13 Dec 2021
    • US
    • 11199778

    Polymer Brush Adhesion Promoter With Uv Cleavable Linker

    • 15 Nov 2021
    • US
    • 11177130

    Patterning Material Film Stack With Metal-containing Top Coat For Enhanced Sensitivity In Extreme Ultraviolet (euv) Lithography

    • 05 Jul 2021
    • US
    • 11056418

    Semiconductor Microcooler

    • 28 Jun 2021
    • US
    • 11049789

    Semiconductor Microcooler

    • 14 Jun 2021
    • US
    • 11037786

    Patterning Material Film Stack With Metal-containing Top Coat For Enhanced Sensitivity In Extreme Ultraviolet (euv) Lithography

    • 03 May 2021
    • US
    • 10998191

    Graded Hardmask Interlayer For Enhanced Extreme Ultraviolet Performance

    • 29 Mar 2021
    • US
    • 10964541

    Method To Improve Adhesion Of Photoresist On Silicon Substrate For Extreme Ultraviolet And Electron Beam Lithography

    • 01 Mar 2021
    • US
    • 10937764

    Three-dimensional Microelectronic Package With Embedded Cooling Channels

    • 09 Nov 2020
    • US
    • 10828678

    Drying An Extreme Ultraviolet (euv) Pellicle

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Top collaborators

LM
Luciana Meli

Luciana Meli

Senior Manager: Patterning & Metrology
JR
Jed Rankin

Jed Rankin

Photomask Supply and Development Strategy
AG
Allen Gabor

Allen Gabor

Distinguished Engineer
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Work location

IBM Research - Yorktown HeightsYorktown Heights, NY USA

Contact

More publications

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