Mitigating X‑ray–Induced Damage in CD‑SAXS Metrology of EUV Resists
- Philipp Wieser
- Kevin Yager
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Publications
5 results at SPIE Advanced Lithography + Patterning 2026
IBM Lithography Roadmap: Need for Future Lithography Tools and Masks and Requirements for Resists to Avoid Stochastic Defects
- Allen Gabor
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Scaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
In-line XPS metrology for area selective deposition processes on patterned structures
- Manasa Medikonda
- Linda Wangoh
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Exploring the Limits of Contact Hole Patterning with High NA EUV Lithography
- Dario Goldfarb
- Zheng Chen
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026