Measuring Contact Hole Distributions for Use in Predicting Missing Contact Hole Rates
- Elisa Novelli
- Chris A. Mack
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Publications
13 results at SPIE Advanced Lithography + Patterning 2026
Evaluation of High NA EUV for Subtractive Interconnect Patterning in Advanced Nodes
- Chris Penny
- Joe Lee
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperExploring the Limits of Contact Hole Patterning with High NA EUV Lithography
- Dario Goldfarb
- Zheng Chen
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Talk