A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes
- Michael G. Rosenfield
- S. Rishton
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- 1991
- Microelectronic Engineering
Paper
Publications
221 results at Microelectronic Engineering
Lithographic performance of an EL-3 system at 0.25μm groundrules
- T. Newman
- M.G.R. Thomson
- et al.
- 1991
- Microelectronic Engineering
PaperLight scattering properties of x-ray lithography mask substrates
- J.R. Maldonado
- Y. Vladimirsky
- et al.
- 1991
- Microelectronic Engineering
PaperFabrication of sub-100nm dual-gate MODFETS with enhanced performance
- K.Y. Lee
- K. Ismail
- et al.
- 1991
- Microelectronic Engineering
PaperThe electron beam proximity printing lithography, a candidate for the 0.35 and 0.25 micron chip generations
- U. Behringer
- W. Haug
- et al.
- 1991
- Microelectronic Engineering
PaperNew high resolution and high sensitivity deep UV, x-ray, and electron beam resists
- Michael Hatzakis
- Kevin J. Stewart
- et al.
- 1990
- Microelectronic Engineering
PaperCW and time resolved luminescence study of dry etch damage in semiconductor wires
- B.E. Maile
- G. Mayer
- et al.
- 1990
- Microelectronic Engineering
PaperSilylation of resist materials using di- and polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1990
- Microelectronic Engineering
PaperThermoelastic effects on x-ray lithography masks under pulsed irradiation
- Iqbal Shareef
- Juan R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
PaperA simple bilayer lift-off process
- David F. Witman
- Jane M. Shaw
- et al.
- 1990
- Microelectronic Engineering
Paper