MOVPE on patterned substrates: a new fabrication method for nanometer structure devices
- Yvan D. Galeuchet
- Hugo Rothuizen
- et al.
- 1991
- Microelectronic Engineering
Paper
Publications
221 results at Microelectronic Engineering
Light scattering properties of x-ray lithography mask substrates
- J.R. Maldonado
- Y. Vladimirsky
- et al.
- 1991
- Microelectronic Engineering
PaperThe electron beam proximity printing lithography, a candidate for the 0.35 and 0.25 micron chip generations
- U. Behringer
- W. Haug
- et al.
- 1991
- Microelectronic Engineering
PaperLaser cleaning of wafer surfaces and lithography masks
- W. Zapka
- A.C. Tam
- et al.
- 1991
- Microelectronic Engineering
PaperElectron beam tester measurements of switching noise in VLSI circuits
- Keith A. Jenkins
- David F. Heidel
- 1991
- Microelectronic Engineering
PaperDetermination of proximity effect correction parameters for 0.1 μm electron-beam lithography
- Michael G. Rosenfield
- S.J. Wind
- et al.
- 1990
- Microelectronic Engineering
PaperThermoelastic effects on x-ray lithography masks under pulsed irradiation
- Iqbal Shareef
- Juan R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
PaperCW and time resolved luminescence study of dry etch damage in semiconductor wires
- B.E. Maile
- G. Mayer
- et al.
- 1990
- Microelectronic Engineering
PaperSilylation of resist materials using di- and polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1990
- Microelectronic Engineering
PaperDry ridge etching of AlGaAs GRINSCH lasers
- M. Jost
- P. Buchmann
- et al.
- 1990
- Microelectronic Engineering
Paper