Hiroshi Ito, Reinhold Schwalm
JES
In this paper we describe a novel method of eliminating charging during the high resolution SEM inspection and dimensional measurements of x-ray and optical masks. A soluble conducting polymer, polyaniline, is spin-coated on the mask and found to prevent charging even at 15 KV. This method is a non-destructive process in contrast to the commonly used technique of metal deposition, since the polymer can be cleanly removed without any damage to the mask. © 1991.
Hiroshi Ito, Reinhold Schwalm
JES
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