Why the close-packed Ni(111) surface dissociatively chemisorbs oxygen and nucleates oxide faster than the more open Ni(100) surfaceC.R. Brundle1985JVSTA
Effect of ion bombardment during deposition on the x-ray microstructure of thin silver filmsT.C. HuangG. Limet al.1985JVSTA
Summary Abstract: The origin of oxidation induced enhancement of Si+ sputter yield in SIMSD.J. VitkavageJ.G. Clabeset al.1985JVSTA
Effects of biased cosputtering on resistivity and step coverage in tungsten silicide filmsK.W. ChoiK.Y. Ahn1985JVSTA
Properties and Microelectronic Applications of Thin Films of Refractory Metal NitridesMarc Wittmer1985JVSTA