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Microelectronic Engineering
The 300 K kinetics of dissociative chemisorption and oxide island nucleation and growth are compared for Ni(100) and Ni(111). We conclude that the behavior of oxygen sticking probability as a function of coverage can be understood in terms of direct Langmuir adsorption (no molecular diffusion) and the availability of active empty clusters of adsorption sites of certain sizes and configurations. © 1985, American Vacuum Society. All rights reserved.
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
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EMC 2001
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures