Diazopolysiloxanes: Unique imageable barrier layers
- E. Babich
- J.M. Shaw
- et al.
- 1986
- Microelectronic Engineering
Paper
Publications
47 results for Jane M. Shaw
Polysiloxanes for deep UV lithography
- J.M. Shaw
- M. Hatzakis
- et al.
- 1985
- Microelectronic Engineering
PaperA comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers
- E. Babich
- J. Paraszczak
- et al.
- 1985
- Microelectronic Engineering
PaperSUMMARY ABSTRACT: CHARACTERISTICS OF ORGANOSILICON POLYMERS IMMERSED IN GASEOUS PLASMAS.
- J. Paraszczak
- E. Babich
- et al.
- 1984
- Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
PaperMultilayer resist systems using polysiloxanes as etch masks
- J. Paraszczak
- J.M. Shaw
- et al.
- 1983
- Microlithography 1983
Conference paperPerformance characteristics of diazo-type photoresists under e-beam and optical exposure
- Jane M. Shaw
- Michael Hatzakis
- 1978
- IEEE T-ED
PaperCharacterization of Positive Photoresist
- Frederick H. Dill
- William P. Hornberger
- et al.
- 1975
- IEEE T-ED
Paper