Characterization of reactive dissolution and swelling of polymer films using a quartz crystal microbalance and visible and infrared reflectance spectroscopy
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2005
- Macromolecules
Publications
85 results for Frances A. Houle
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Reactive dissolution kinetics of lithographic copolymers
- William Hinsberg
- Frances Houle
- et al.
- 2004
- Microlithography 2004
Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004
Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography
- G.M. Gallatin
- F.A. Houle
- et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Characterization of photoresist spatial resolution by interferometric lithography
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Using the critical ionization model for resist development to estimate contrast curves and roughening
- Frances A. Houle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003