Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
17 Mar 2004

Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging

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Abstract

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Date

17 Mar 2004

Publication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Authors

  • F.A. Houle
  • W.D. Hinsberg
  • M.I. Sanchez
IBM-affiliated at time of publication

Topics

  • Physical Sciences

Resources

  • Publication

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