Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Publications
66 results for Martha I. Sanchez
Fast calculation of images for high numerical aperture lithography
- Alan E. Rosenbluth
- Gregg Gallatin
- et al.
- 2004
- SPIE Advanced Lithography 2004
Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Does line edge roughness matter?: FEOL and BEOL perspectives
- Qinghuang Lin
- Chuck Black
- et al.
- 2003
- Microlithography 2003
Using the critical ionization model for resist development to estimate contrast curves and roughening
- Frances A. Houle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Characterization of photoresist spatial resolution by interferometric lithography
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Use of interferometric lithography to characterize the spatial resolution of a photoresist film
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- J. Photopolym. Sci. Tech.
High numerical aperture lithographic imagery at the Brewster angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems