Publications

66 results for Martha I. Sanchez

Contribution of EUV resist counting statistics to stochastic printing failures
- - William D. Hinsberg
  - Gregory M. Wallraff
  - et al.
- 2021
- JM3
An analysis of EUV resist stochastic printing failures
- - Martha I. Sanchez
  - Gregory M. Wallraff
  - et al.
- 2019
- EUVL 2019
Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2017
- SPIE Advanced Lithography 2017
DSA patterning options for logics and memory applications
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2017
- SPIE Advanced Lithography 2017
Strategies to enable directed self-Assembly contact hole shrink for tight pitches
- - Kristin Schmidt
  - Hitoshi Osaki
  - et al.
- 2016
- SPIE Advanced Lithography 2016
DSA via hole shrink for advanced node applications
- - Cheng Chi
  - Chi Chun Liu
  - et al.
- 2016
- SPIE Advanced Lithography 2016
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2014
- SPIE Advanced Lithography 2014
Defects on high resolution negative-tone resist The revenge of the blobs
- - M.I. Sanchez
  - L.K. Sundberg
  - et al.
- 2013
- SPIE Photomask Technology + EUV Lithography 2013
Monitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- - M.I. Sanchez
  - L.K. Sundberg
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- - Ramakrishnan Ayothi
  - Lovejeet Singh
  - et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics