Low stress development of poly(methylmethacrylate) for high aspect ratio structures

M.J. Rooks; E. Kratschmer; R. Viswanathan; J.A. Katine; R.E. Fontana Jr.; Scott A. MacDonald

doi:10.1116/1.1524971

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Paper

09 Dec 2002

Low stress development of poly(methylmethacrylate) for high aspect ratio structures

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Abstract

Magnetic head requirements for high aspect ratio pole tips were met using single-layer PMMA exposed at 100 kV. Using cooled mixtures of IPA and water and ultrasonic agitation, 14:1 aspect ratios in resist were demonstrated.

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Theory of temperature-induced Mott transitions

Ellen J. Yoffa, David Adler

Physical Review B

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Ion beam patterning of block copolymer thin films

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Abstract

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