A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- Hiroshi Ito
- L.A. Pederson
- et al.
- 2019
- JES
Paper
Publications
58 results for Scott A. MacDonald
Nanoscale processing for thin film recording heads
- J.A. Katine
- R.E. Fontana Jr.
- et al.
- 2003
- INTERMAG 2003
Conference paperNanoscale processing for thin film recording heads
- J.A. Katine
- R.E. Fontana
- et al.
- 2003
- INTERMAG 2003
Conference paperThe effect of polymer structure on the efficiency of acid generation from triarylsulfonium salts
- Dennis R. McKean
- Ulrich P. Schaedeli
- et al.
- 2003
- Journal of Polymer Science Part A: Polymer Chemistry
PaperLow stress development of poly(methylmethacrylate) for high aspect ratio structures
- M.J. Rooks
- E. Kratschmer
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperCharacterization of a Novolac-Based Three-Component Deep-UV Resist
- Dennis R. McKean
- Scott A. MacDonald
- et al.
- 2002
- Chemistry of Materials
PaperA Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal
- Scott A. MacDonald
- Nicholas J. Clecak
- et al.
- 2002
- Chemistry of Materials
PaperPlasma-Developable Photoresist Systems Based on Chemical Amplification
- Scott A. MacDonald
- Hiroshi Ito
- et al.
- 2002
- Chemistry of Materials
PaperReactivity and Polymerization of Isopropenyl tert-Butyl Ketone: A Twisted α,β-Unsaturated Enone
- Hiroshi Ito
- Scott A. MacDonald
- et al.
- 2002
- Macromolecules
PaperPhotoinitiated Interfacial Cationic Polymerization
- Anders Hult
- Scott A. MacDonald
- et al.
- 2002
- Macromolecules
Paper