Publications

29 results for R. Viswanathan

Image processing using shape recognition for alignment to damaged registration marks in electron beam lithography
- - E. Kratschmer
  - D.P. Klaus
  - et al.
- 2009
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Demonstration of highly scaled FinFET SRAM cells with high-Κ/metal gate and investigation of characteristic variability for the 32 nm node and beyond
- - H. Kawasaki
  - M. Khater
  - et al.
- 2008
- IEDM 2008
Adaptive wiring for 20 nm scale epitaxial silicon Ohmic contacts to silicon nanowires
- - M.J. Rooks
  - G.M. Cohen
  - et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes
- - Steven Steen
  - Sharee J. McNab
  - et al.
- 2006
- Microelectronic Engineering
Experimental optimization of the electron-beam proximity effect forward scattering parameter
- - M.J. Rooks
  - N. Belic
  - et al.
- 2005
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Looking into the crystal ball: Future device learning using hybrid E-beam and optical lithography
- - S.E. Steen
  - S.J. McNab
  - et al.
- 2005
- Microlithography 2005
Aggressively scaled (0.143 μm ²) 6T-SRAM cell for the 32 nm node and beyond
- - D. Fried
  - J. Hergenrother
  - et al.
- 2004
- IEDM 2004
Low stress development of poly(methylmethacrylate) for high aspect ratio structures
- - M.J. Rooks
  - E. Kratschmer
  - et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
E-beam writing: A next-generation lithography approach for thin-film head critical features
- - R.E. Fontana
  - J.A. Katine
  - et al.
- 2002
- IEEE Transactions on Magnetics
Very high performance 50 nm CMOS at low temperature
- - S.J. Wind
  - L.T. Shi
  - et al.
- 1999
- IEDM 1999