J.W. Coburn, E. Taglauer, et al.
Japanese Journal of Applied Physics
Paper
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
Abstract
A study of the etching and deposition of plasma perfluoropolymer thin films has been carried out by using quartz-crystal microbalance methods for a range of feed gas mixtures.
Related
J.W. Coburn, Harold F. Winters
Journal of Applied Physics
F. Fracassi, J.W. Coburn
Journal of Applied Physics
Conference paper
Surface processes in plasma-assisted etching
J.W. Coburn
Symposium on Process Physics and Modeling in Semiconductor Technology 1990