J.W. Coburn
JVSTA
Paper
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
Abstract
A study of the etching and deposition of plasma perfluoropolymer thin films has been carried out by using quartz-crystal microbalance methods for a range of feed gas mixtures.
Related
J.W. Coburn, Kenneth Lee
Journal of Applied Physics
Natasha C.Us, R.W. Sadowski, et al.
Plasma Chemistry and Plasma Processing
U. Gerlach-Meyer, J.W. Coburn, et al.
Journal of Applied Physics