Conference paper
Role of ions in reactive ion etching
J.W. Coburn
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
Abstract
A study of the etching and deposition of plasma perfluoropolymer thin films has been carried out by using quartz-crystal microbalance methods for a range of feed gas mixtures.
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