Publications

3 results for E. Occhiello

Etching of silicon and silicon dioxide by halofluorocarbon plasmas
- - E. Occhiello
  - F. Garbassi
  - et al.
- 2000
- Journal of Physics D: Applied Physics
On the effect of low-energy ion bombardment on polystyrene and polymethylmethacrylate etch rates in rf plasmas
- - E. Occhiello
  - F. Garbassi
  - et al.
- 1989
- Plasma Chemistry and Plasma Processing
Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
- - F. Fracassi
  - E. Occhiello
  - et al.
- 1987
- Journal of Applied Physics