Etching of silicon and silicon dioxide by halofluorocarbon plasmas
- E. Occhiello
- F. Garbassi
- et al.
- 2000
- Journal of Physics D: Applied Physics
Paper
Publications
3 results for E. Occhiello
On the effect of low-energy ion bombardment on polystyrene and polymethylmethacrylate etch rates in rf plasmas
- E. Occhiello
- F. Garbassi
- et al.
- 1989
- Plasma Chemistry and Plasma Processing
PaperEffect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
- F. Fracassi
- E. Occhiello
- et al.
- 1987
- Journal of Applied Physics
Paper