J.W. Coburn, E.W. Eckstein, et al.
Journal of Applied Physics
Paper
Plasma-assisted etching of tungsten films: A quartz-crystal microbalance study
Abstract
The plasma-assisted etching of magnetron-sputtered polycrystalline tungsten films in CF4-H2 and CF4-O2 glow discharges has been studied as a function of ion energy using quartz-crystal microbalance methods supplemented by vacuum-transfer Auger electron spectroscopy and actinometric emission spectroscopy.
Related
T.J. Chuang, H.F. Winters, et al.
Applications of Surface Science
J.W. Coburn, Eric Kay
Journal of Macromolecular Science: Part A - Chemistry
J.W. Coburn, E. Taglauer, et al.
Japanese Journal of Applied Physics