Conference paper
Surface processes in plasma-assisted etching
J.W. Coburn
Symposium on Process Physics and Modeling in Semiconductor Technology 1990
A simple phenomenological theory of alloy sputtering is developed which suggests that in some instances the depth resolution of depth profiling measurements is limited by the time it takes to create a layer of altered chemical composition at the surface.
J.W. Coburn
Symposium on Process Physics and Modeling in Semiconductor Technology 1990
Harold F. Winters
The Journal of Chemical Physics
Harold F. Winters, F.A. Houle
Journal of Applied Physics
Harold F. Winters, H. Coufal, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films