Revanth Kodoru, Atanu Saha, et al.
arXiv
Paper
Development of 157 nm positive resists
Abstract
A 157 nm resist design that utilizes a hexafluoroisopropanol as an acidic group and an α-trifluoromethylacrylic moiety as a repeat unit is described. The fluoroalcohol group is pendant form either norbornene or styrene. The residual casting solvent concentration is much smaller in the fluoropolymers than in the hydrocarbon counterparts.
Related
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering