Publications

15 results for Nicolette Fender

Optimization of pitch-split double patterning phoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- ASMC 2011
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fabrication of dual damascene BEOL structures using a Multi-Level Multiple Exposure (MLME) scheme - Part 1. Lithographic patterning
- - Dario L. Goldfarb
  - Stefan Harrer
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Fabrication of dual damascene BEOL structures using a multi-level multiple exposure (MLME) scheme - Part 2. RIE-based pattern transfer and completion of dual damascene process yielding an electrically functional via chain
- - Stefan Harrer
  - John C Arnold
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Process characterization of pitch-split resist materials for application at 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Defects and luminescence behavior of cubic F23 [(NH₄(18-Crown-6))₄MnX₄] [TIX₄]₂ (X = CI, Br) crystals
- - Nicolette S. Fender
  - Ishenkumba A. Kahwa
  - et al.
- 2002
- Journal of Solid State Chemistry
Characterization and acid diffusion measurements of new strong acid photoacid generators
- - G.M. Wallraff
  - Carl E. Larson
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Aliphatic platforms for the design of 157 nm chemically amplified resists
- - Hiroshi Ito
  - Hoa D. Truong
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- - Hiroshi Ito
  - H.D. Truong
  - et al.
- 2002
- J. Photopolym. Sci. Tech.
Fluoropolymer platforms for 157 nm resist applications
- - Hiroshi Ito
  - G.M. Wallraff
  - et al.
- 2001
- International Conference on Microprocesses and Nanotechnology 2001