Publications

120 results for William D. Hinsberg

Contribution of EUV resist counting statistics to stochastic printing failures
- - William D. Hinsberg
  - Gregory M. Wallraff
  - et al.
- 2021
- JM3
Measurement of Thin-Film Dissolution Kinetics using a Quartz Crystal Microbalance
- - W.D. Hinsberg
  - C.G. Willson
  - et al.
- 2019
- JES
An analysis of EUV resist stochastic printing failures
- - Martha I. Sanchez
  - Gregory M. Wallraff
  - et al.
- 2019
- EUVL 2019
Fundamental understanding of chemical processes in extreme ultraviolet resist materials
- - Oleg Kostko
  - Bo Xu
  - et al.
- 2018
- Journal of Chemical Physics
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2014
- SPIE Advanced Lithography 2014
Monitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- - M.I. Sanchez
  - L.K. Sundberg
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- - Ramakrishnan Ayothi
  - Lovejeet Singh
  - et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Visualization of the develop process
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- - Anuja De Silva
  - Linda K. Sundberg
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- - Chris Bencher
  - Jeffrey Smith
  - et al.
- 2011
- SPIE Advanced Lithography 2011