Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Initial results for the continuous microwave processing of wide webs using a new microwave applicator are presented. The results show that acceptable uniformity can be obtained using this system and that with the appropriate controls, a very tight process window can be maintained to produce preimpregnated glass cloth (prepreg) for use in circuit board manufacture.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
John G. Long, Peter C. Searson, et al.
JES
T.H. Ning
MRS Spring Meeting 1996
E. Burstein
Ferroelectrics