On the effect of low-energy ion bombardment on polystyrene and polymethylmethacrylate etch rates in rf plasmas
- E. Occhiello
- F. Garbassi
- et al.
- 1989
- Plasma Chemistry and Plasma Processing
Publications
4 results at Plasma Chemistry and Plasma Processing
Quartz crystal microbalance simulation of the directionality of Si etching in CF4 glow discharges
- Natasha C.Us
- R.W. Sadowski
- et al.
- 1986
- Plasma Chemistry and Plasma Processing
Spatially resolved optical emission studies of fluorocarbon RF plasma through the use of UV-transmitting optical fibers
- G.S. Selwyn
- E. Kay
- 1985
- Plasma Chemistry and Plasma Processing
Plasma-assisted etching
- J.W. Coburn
- 1982
- Plasma Chemistry and Plasma Processing