E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
A technique for collecting spatially resolved optical emission from large rf plasma reactors is described. To demonstrate the sensitivity and versatility of this technique, emission within the quartz ultraviolet, 225-253 nm, was studied with particular emphasis on the "plasma dark space." Spatial variations of CF2, AlF, and C atom emission were monitored. These results have been used for discussion and evaluation of various plasma excitation and reaction mechanisms involving atomic carbon in fluorocarbon plasmas. © 1985 Plenum Publishing Corporation.
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
R. Ghez, J.S. Lew
Journal of Crystal Growth
Xikun Hu, Wenlin Liu, et al.
IEEE J-STARS
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999