Publications

14 results at SPIE Advanced Lithography 2013

Buckling characterization of gate all around silicon nanowires
- - Shimon Levi
  - Ishai Schwarzband
  - et al.
- 2013
- SPIE Advanced Lithography 2013
CD optimization methodology for extending optical lithography
- - C. Wong
  - G. Seevaratnam
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Etch correction and OPC, a look at the current state and future of etch correction
- - Ian Stobert
  - Derren Dunn
- 2013
- SPIE Advanced Lithography 2013
Advanced plasma etch for the 10nm node and beyond
- - Eric Joseph
  - Sebastian Engelmann
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
- - Hsin-Yu Tsai
  - Hiroyuki Miyazoe
  - et al.
- 2013
- SPIE Advanced Lithography 2013
On the accuracy of different Fourier transforms of VLSI designs
- - Rajai Nasser
  - Paul Hurley
- 2013
- SPIE Advanced Lithography 2013
Directed self-assembly process implementation in a 300mm pilot line environment
- - Chi-Chun Liu
  - I. Cristina Estrada-Raygoza
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Deterministically isolated gratings through the directed self-assembly of block copolymers
- - Gregory Sadasdf Doerk
  - Joy Y. Cheng
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Enabling reverse tone imaging for via levels using attenuated Phase Shift Mask and source optimization
- - Bassem Hamieh
  - Hyun Chol Choi
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Development of KrF hybrid resist for a dual isolation application
- - Sen Liu
  - Steven Holmes
  - et al.
- 2013
- SPIE Advanced Lithography 2013