Topology and context-based pattern extraction using line-segment Voronoi diagram
- Sandeep Kumar Dey
- Panagiotis Cheilaris
- et al.
- 2015
- SPIE Advanced Lithography 2015
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24 results at SPIE Advanced Lithography 2015
Forbidden pitches: Causes, source optimization, and their role in design rules
- Ştefan Apostol
- Paul Hurley
- 2015
- SPIE Advanced Lithography 2015
Inverse lithography using sparse mask representations
- Radu C. Ionescu
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Experiments using automated sample plan selection for OPC modeling
- Ramya Viswanathan
- Om Jaiswal
- et al.
- 2015
- SPIE Advanced Lithography 2015
Accurate and fast computation of transmission cross coefficients
- Ştefan Apostol
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Scatterometry-based defect detection for DSA in-line process control
- Robin Chao
- Chi Chun Liu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
- Dhairya Dixit
- Samuel O'Mullane
- et al.
- 2015
- SPIE Advanced Lithography 2015
Low-energy electron (0-100eV) interaction with resists using LEEM
- A. Thete
- Daniël Geelen
- et al.
- 2015
- SPIE Advanced Lithography 2015
EUV processing and characterization for BEOL
- Nicole Saulnier
- Yongan Xu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Induced e-beam charge impact on spatial orientation of gate-All-Around silicon wires device fabricated on boron nitride substrate
- Shimon Levi
- Konstantin Chirko
- et al.
- 2015
- SPIE Advanced Lithography 2015