A new mask evaluation tool, the microlithography simulation microscope aerial image measurement system
- R.A. Budd
- D.B. Dove
- et al.
- 1994
- Microlithography 1994
Conference paper
Publications
14 results at Microlithography 1994
A comprehensive evaluation of major phase shift mask technologies for isolated gate sinictuies in logic designs
- Lars W. Liebmann
- Thomas H. Newman
- et al.
- 1994
- Microlithography 1994
Conference paperImpact of attenuated mask topography on lithographic performance
- Richard A. Ferguson
- William J. Adair
- et al.
- 1994
- Microlithography 1994
Conference paperQuantitative stepper metrology using the focus monitor test mask
- T.A. Brunner
- A.L. Martin
- et al.
- 1994
- Microlithography 1994
Conference paperScattered light in photolithographic lenses
- Joseph P. Kirk
- 1994
- Microlithography 1994
Conference paperExperimental verification of high numerical aperture effects in photoresist
- Donis G. Flagello
- Tom Milster
- 1994
- Microlithography 1994
Conference paperApplication of the Aerial Image Measurement System (AIMSTM) to the Analysis of Binary Mask Imaging and Resolution Enhancement Techniques
- R. Martino
- R. Ferguson
- et al.
- 1994
- Microlithography 1994
Conference paperFabrication of phase shifting masks employing multi-layer films
- T.C. Chicu
- K.K. Shih
- et al.
- 1994
- Microlithography 1994
Conference paperRole of residual casting solvent in dissolution behavior of poly (3-methyl-4-hydroxystyrene) films
- Veena Rao
- William D. Hinsberg
- et al.
- 1994
- Microlithography 1994
Conference paperMaterials evaluation of antireflective coatings for single-layer 193-nm lithography
- Roderick R. Kunz
- Robert D. Allen
- 1994
- Microlithography 1994
Conference paper