Veena Rao, William D. Hinsberg, et al.
Microlithography 1994
Scattered light, flare, is present in the images formed by all photolithography lenses and it reduces lithographic process tolerances. It varies from lens to lens and with time, but is easily measured by observation of images of opaque objects formed in positive photoresist. The scattered light halo of a lens is modeled and the model used to estimate the flare for any reticle used with that lens.
Veena Rao, William D. Hinsberg, et al.
Microlithography 1994
Amotz Bar-Noy, Sudipto Guha, et al.
ACM Transactions on Algorithms
Alan E. Rosenbluth, Gregg Gallatin, et al.
SPIE Optics + Photonics 2005
Jacob E. Fromm
Journal of Computational Physics