The feasibility of using image parameters for test pattern selection during OPC model calibration
- Amr Abdo
- Ramya Viswanathan
- 2010
- SPIE Advanced Lithography 2010
Publications
3548 results for Mathematical Sciences
Spacer defined double patterning for sub-72 nm pitch logic technology
- Ryoung-Han Kim
- Erin McLellan
- et al.
- 2010
- SPIE Advanced Lithography 2010
Predicting and reducing substrate induced focus error
- Bernhard Liegl
- Brian Sapp
- et al.
- 2010
- SPIE Advanced Lithography 2010
Toward perfect on-wafer pattern placement: Stitched overlay exposure tool characterization
- Christopher P. Ausschnitt
- Timothy A. Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Overlay characterization and matching of immersion photoclusters
- Blandine Minghetti
- Timothy Brunner
- et al.
- 2010
- SPIE Advanced Lithography 2010
Wildcarded identity-based encryption
- Michel Abdalla
- James Birkett
- et al.
- 2010
- Journal of Cryptology
Decidable fragments of many-sorted logic
- Aharon Abadi
- Alexander Rabinovich
- et al.
- 2010
- Journal of Symbolic Computation
Tracking motion, deformation, and texture using conditionally gaussian processes
- Tim K. Marks
- John R. Hershey
- et al.
- 2010
- IEEE TPAMI
Efficient ID-based registration protocol featured with user anonymity in mobile IP networks
- Lanjun Dang
- Weidong Kou
- et al.
- 2010
- IEEE TWC