Plasma swelling of photoresist
- Yue Kuo
- 1993
- Japanese Journal of Applied Physics
Paper
Publications
129 results at Japanese Journal of Applied Physics
Reactive ion etching of sputter deposited tantalum with Cf4, Cf3Cl, and CHF3
- Yue Kuo
- 1993
- Japanese Journal of Applied Physics
PaperFrame sequential color thin film transistor/liquid crystal displays: Display characteristics and grayscale consideration
- Hiap Liew Ong
- 1993
- Japanese Journal of Applied Physics
PaperMicro-temperature measurements on semiconductor laser mirrors by reflectance modulation: A newly developed technique for laser characterization
- Peter-Wolf Gang Epperlein
- 1993
- Japanese Journal of Applied Physics
PaperEvolution of sn environment in algaas alloys
- J. Pant
- K. Pansewicz
- et al.
- 1993
- Japanese Journal of Applied Physics
PaperSub-100-nm-Resolution Zone Plate Soft x-Ray Microscope Using Undulator Radiation
- Yasushi Kagoshima
- Masami Ando
- et al.
- 1993
- Japanese Journal of Applied Physics
PaperPattern formation in the transient periodic splay freedericksz transition in a nematic liquid crystal
- Hiap. Liew Ong
- 1992
- Japanese Journal of Applied Physics
PaperSelective Deposition and Bond Strain Relaxation in Silicon PECVD Using Time Modulated Silane Flow
- Gregory N. Parsons
- John J. Boland
- et al.
- 1992
- Japanese Journal of Applied Physics
PaperCalculations of phase shift and reflectivity for phase shifting masks employing multi-layer films
- Trieu C. Chieu
- 1992
- Japanese Journal of Applied Physics
PaperCrossed-beam study of initial vibrational distribution of krf excimer produced in the reaction of kr* + f2
- Haruko Komatsu
- Satoru S. Kano
- et al.
- 1992
- Japanese Journal of Applied Physics
Paper