Conference paper
Recent advances in MRAM technology
W.J. Gallagher, D.W. Abraham, et al.
VLSI Technology 2005
Multilayers of Co/Cu, sputter deposited onto thin kapton films, display very large room-temperature magnetoresistance, almost as large as that found in similar structures prepared on silicon wafers. Such flexible structures suggest a number of intriguing technological applications. Plane-view and cross section transmission electron micrographs reveal a high degree of structural order with grains extending over several hundred angstrom with sharp grain boundaries. © 1992 The Japan Society of Applied Physics.
W.J. Gallagher, D.W. Abraham, et al.
VLSI Technology 2005
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Applied Physics Letters
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Microscopy and Microanalysis
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