Self-segregating materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2008
- SPIE Advanced Lithography 2008
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3520 results for Mathematical Sciences
Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's law
- Hiroshi Ito
- 2008
- SPIE Advanced Lithography 2008
Resist freezing process for double exposure lithography
- Kuang-Jung Rex Chen
- Wu-Song Huang
- et al.
- 2008
- SPIE Advanced Lithography 2008
The limitations of high index resists for 193nm hyper-NA lithography
- Gregory McIntyre
- Daniel Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
Graded spin-on organic bottom antireflective coating for high NA lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
Lactones in 193 nm resists: What do they do?
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2008
- SPIE Advanced Lithography 2008
Optimizing Models Based OPC fragmentation using genetic algorithms
- Domenico A. Dipaola
- Ian Mobert
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Improvements in accuracy of dense OPC models
- Chidam Kallingal
- James Oberschmidt
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Challenges of implementing contour modeling in 32nm technology
- Daniel Fischer
- Geng Han
- et al.
- 2008
- SPIE Advanced Lithography 2008