Summary Abstract: Modification of metals by low energy ions during thin film deposition
- J.M.E. Haroer
- J.J. Cuomo
- 1985
- JVSTA
Publications
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- Materials Discovery
3438 results for Materials Discovery
Summary Abstract: Titanium silicide films prepared by reactive sputtering
- V. Deline
- F.M. d’Heurle
- 1985
- JVSTA
High resolution photoemission investigation: The oxidation of W
- Guy Hollinger
- F.J. HimDsel
- et al.
- 1985
- JVSTA
History of the modern cryopump
- M.C. Bridwell
- J.G. Rodes
- 1985
- JVSTA
Summary Abstract: The origin of oxidation induced enhancement of Si+ sputter yield in SIMS
- D.J. Vitkavage
- J.G. Clabes
- et al.
- 1985
- JVSTA
Photoemission spectroscopy study of aluminum-polyimide interface
- J.W. Bartha
- P.O. Hahrt
- et al.
- 1985
- JVSTA
Effects of biased cosputtering on resistivity and step coverage in tungsten silicide films
- K.W. Choi
- K.Y. Ahn
- 1985
- JVSTA
Properties and Microelectronic Applications of Thin Films of Refractory Metal Nitrides
- Marc Wittmer
- 1985
- JVSTA
Reactive sputtering of copper and silicon near the sputtering threshold
- T.M. Mayer
- J.M.E. Harper
- et al.
- 1985
- JVSTA
Summary Abstract: Chromium as an inert marker in copper oxidation
- M.A. Frisch
- 1985
- JVSTA