Stress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporation
- D.S. Yee
- J. Floro
- et al.
- 1985
- JVSTA
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- Materials Discovery
3488 results for Materials Discovery
Effect of ion bombardment during deposition on the x-ray microstructure of thin silver films
- T.C. Huang
- G. Lim
- et al.
- 1985
- JVSTA
The etching of Cu(100) with Cl2
- Harold F. Winters
- 1985
- JVSTA
Summary Abstract: Plasma potentials of 13.56 MHz rf argon glow discharges in a planar system
- K. Kehler
- J.W. Coburn
- et al.
- 1985
- JVSTA
Interdiffusion at the polyimide-Cu interface
- R.M. Tromp
- F. Leqoues
- et al.
- 1985
- JVSTA
High resolution photoemission investigation: The oxidation of W
- Guy Hollinger
- F.J. HimDsel
- et al.
- 1985
- JVSTA
Polymerization of two unsaturated fatty acid esters in Langmuir-Blodgett films as studied by IR spectroscopy
- J. Rabe
- J.F. Rabolt
- et al.
- 1985
- Thin Solid Films
Summary Abstract: Titanium silicide films prepared by reactive sputtering
- V. Deline
- F.M. d’Heurle
- 1985
- JVSTA
Secondary electron effect on power-voltage relationship in rf sputtering
- B. Bumble
- J.J. Cuomo
- 1985
- JVSTA
The etching of W(111) with XeF2
- Harold F. Winters
- 1985
- JVSTA