Synchrotron-radiation excited carbon is photoemission study of Cr/organic polymer interfacesJ.L. JordanP.N. Sandaet al.1986JVSTA
Summary Abstract: Reactive ion-etching-related Si surface residues and subsurface disorderG.S. OehrleinJ.G. Clabeset al.1986JVSTA
Soft X-ray photoemission study of the silicon-fluorine etching reactionF.R. McFeelyJ.F. Moraret al.1986Surface Science
Summary Abstract: Classical trajectory calculations of photon-stimulated desorption of ions from alkali-halidesR.E. WalkupPh. Avouris1986JVSTA
Effect of nucleation layers on the growth and magnetic properties of CoCr and CoCr-X filmsJ.K. Howard1986JVSTA