A simple bilayer lift-off process
- David F. Witman
- Jane M. Shaw
- et al.
- 1990
- Microelectronic Engineering
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Publications
221 results at Microelectronic Engineering
Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography
- Michael G. Rosenfield
- S.J. Wind
- et al.
- 1990
- Microelectronic Engineering
PaperThermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation
- Y. Vladimirsky
- J.R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
PaperFully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- David Seeger
- K.T. Kwietniak
- et al.
- 1989
- Microelectronic Engineering
PaperElectron beam lithography of sub-0.1μm circuits
- S. Rishton
- D. Kern
- et al.
- 1989
- Microelectronic Engineering
PaperFully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
PaperHigh speed electron beam testing
- George Chiu
- Jean-Marc Halbout
- et al.
- 1989
- Microelectronic Engineering
PaperUsing surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas
- G. Sauvé
- M. Moisan
- et al.
- 1989
- Microelectronic Engineering
PaperNanolithography at 350 KV in a TEM
- A.N. Broers
- A.E. Timbs
- et al.
- 1989
- Microelectronic Engineering
PaperHighly selective KOH-based etchant for boron-doped silicon structures
- E. Bassous
- A.C. Lamberti
- 1989
- Microelectronic Engineering
Paper