Dry ridge etching of AlGaAs GRINSCH lasers
- M. Jost
- P. Buchmann
- et al.
- 1990
- Microelectronic Engineering
Paper
Publications
221 results at Microelectronic Engineering
Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation
- Y. Vladimirsky
- J.R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
PaperThermoelastic effects on x-ray lithography masks under pulsed irradiation
- Iqbal Shareef
- Juan R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
PaperApplication of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
PaperChemically assisted ion beam etching process for high quality laser mirrors
- P. Buchmann
- H.P. Dietrich
- et al.
- 1989
- Microelectronic Engineering
PaperHigh speed electron beam testing
- George Chiu
- Jean-Marc Halbout
- et al.
- 1989
- Microelectronic Engineering
PaperNanolithography at 350 KV in a TEM
- A.N. Broers
- A.E. Timbs
- et al.
- 1989
- Microelectronic Engineering
PaperFully scaled 0.5 μm MOS circuits by synchrotron radiation X-ray lithography: Devices fabrication and overlay evaluation
- J. Silverman
- V. Dimilia
- et al.
- 1989
- Microelectronic Engineering
PaperFully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
PaperA comparison of the E-beam sensitivities and relative O2-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- E. Babich
- J. Paraszczak
- et al.
- 1989
- Microelectronic Engineering
Paper