Dry ridge etching of AlGaAs GRINSCH lasers
- M. Jost
- P. Buchmann
- et al.
- 1990
- Microelectronic Engineering
Paper
Publications
221 results at Microelectronic Engineering
New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
- Michael Hatzakis
- Kevin J. Stewart
- et al.
- 1990
- Microelectronic Engineering
PaperThermoelastic effects on x-ray lithography masks under pulsed irradiation
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- Juan R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
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- A.N. Broers
- A.E. Timbs
- et al.
- 1989
- Microelectronic Engineering
PaperFully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- David Seeger
- K.T. Kwietniak
- et al.
- 1989
- Microelectronic Engineering
PaperApplication of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
PaperElectron beam lithography of sub-0.1μm circuits
- S. Rishton
- D. Kern
- et al.
- 1989
- Microelectronic Engineering
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- George Chiu
- Jean-Marc Halbout
- et al.
- 1989
- Microelectronic Engineering
PaperChemically assisted ion beam etching process for high quality laser mirrors
- P. Buchmann
- H.P. Dietrich
- et al.
- 1989
- Microelectronic Engineering
PaperA comparison of the E-beam sensitivities and relative O2-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- E. Babich
- J. Paraszczak
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- 1989
- Microelectronic Engineering
Paper