Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching
- J. Brugger
- G. Beljakovic
- et al.
- 1997
- Microelectronic Engineering
Paper
Publications
221 results at Microelectronic Engineering
An MOS transistor with Schottky source/drain contacts and a self-aligned low-resistance T-gate
- S. Rishton
- K. Ismail
- et al.
- 1997
- Microelectronic Engineering
PaperQuantitative model of the thickness dependence of breakdown in ultra-thin oxides
- 1997
- Microelectronic Engineering
PaperOn the relationship between stress induced leakage currents and catastrophic breakdown in ultra-thin SiO2 based dielectrics
- D.A. Buchanan
- J.H. Stathis
- et al.
- 1997
- Microelectronic Engineering
PaperGate oxide characterization with ballistic electron emission microscopy
- R. Ludeke
- H.J. Wen
- 1997
- Microelectronic Engineering
PaperA conic primitive-based pattern generator for electron-beam lithography of diffractive optical elements
- H. Rothuizen
- D. Prongué
- et al.
- 1997
- Microelectronic Engineering
PaperExplanation for the oxide thickness dependence of breakdown characteristics of metal-oxide-semiconductor structures
- D.J. Dimaria
- 1997
- Microelectronic Engineering
PaperScaling silicon MOS devices to their limits
- S.J. Wind
- D.J. Frank
- et al.
- 1996
- Microelectronic Engineering
PaperThe nanoworld: Chances and challenges
- Heinrich Rohrer
- 1996
- Microelectronic Engineering
PaperElectron beam technology - SEM to microcolumn
- T.H.P. Chang
- M.G.R. Thomson
- et al.
- 1996
- Microelectronic Engineering
Paper